Ultra-High Vacuum AFM/STM


Atomic Force Microscope (AFM) is used for 3D imaging of conducting and non-conducting sample surfaces. It is a valuable tool for failure analysis and is indispensable for FAB process control. ADL has a multi-mode scanning probe system, Dimension 3100 microscope with Nanoscope V controller from Bruker (previously Veeco Instruments). It can achieve sub nm vertical resolution and nm lateral resolution. Maximum Scan area is 100 μm x 100 μm with max vertical range of ~ 8 μm. It is equipped with accessories that enable the following scanning modes:

  1. Atomic Force Microscopy (AFM) in the tapping and contact modes to measure surface topography, roughness, film thickness, feature size etc.
  2. Phase imaging AFM for variations in composition, adhesion, friction, viscoelasticity, differentiating regions of high and low surface adhesion/hardness; contaminant identification, mapping of components in composite materials.
  3. Conductive AFM for mapping of electrical conductivity across medium- to low-conducting and semiconducting materials.
  4. Scanning Tunneling Microscopy (STM) for topography of surface electronic states.
  5. Magnetic Force Microscopy (MFM) for domain structures in magnetic materials.
  6. Nano-manipulation/Nano-lithography for manipulation of nanoscale objects; anodic oxidation for fabrication of nano-patterns at localized areas.
  7. Scanning Capacitance Microscopy (SCM) to map variations in electron (hole) concentration on the surface of a doped semiconductor.
  8. Nano-indentation to measure mechanical properties by nano-indentations, nano-scratching and wear testing for film adhesion and durability studies.
  9. Force Modulation Microscopy to determine relative elasticity/stiffness of surface features.
  10. Fluid cell measurement for AFM imaging of samples in a liquid environment.

Reserve the tool

Instrument Manager: Anju Sharma