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Laurell Technologies Spin Processors

Laurell Technologies Spin ProcessorsTwo spin processors are available in the CAMM for development of unsupported polymer substrates up to 7”x7”. One spinner is dedicated to photoresist apply and the other to fully automated develop/etch/strip/rinse. Specially designed vacuum chucks are available for use with thinner substrates to ensure coating uniformity.

Binghamton University State University of New York
PO BOX 6000   Binghamton, NY 13902-6000

Last Updated: 6/14/10