Atomic Layer Deposition
Manufacturer: Kurt J. Lesker
Model: ALD-150LE
Purpose: Thermal atomic layer deposition
Specifications:
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- Up to 150mm wafers
- Manual loading
- Al2O3 films
- trimethylaluminum and water
- 330”
- Growth Rate is 0.85A per cycle
- Cycle time of 30 seconds
- Expansion capability for additional precursors, enabling different films
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