Contact Mask Aligner
Suss Microtec MJB4
Manual mask alignment and exposure
Sample size: 1” to 4” wafer/substrate, thickness: up to 4 mm.
Mask Size 2” x 2” to 5” x 5”. Mask thickness: up to 4.8 mm.
350 W Hg lamp source (i line exposures)
Constant intensity power supply
Hard contact, soft contact and vacuum contact print modes
